WHAT'S NEW..?

NanoPhotonics developed a new High Sensitivity-65nm Particle & Defect Detection System for Mask Blanks and Bare Wafers. Initial tests show a clear detection of 64nm latex spheres on bare Si-Wafers (see picture below). The system features high sensitivity, high throughput at low cost.

Welcome to NanoPhotonics

NanoPhotonics provides defect inspection equipment for bare wafer surface, edge and back side covering a wide range of materials and substrates in semiconductor manufacturing. Our innovative modular product architecture and strong engineering capabilities allow us to react quickly to customers’ needs.

We support our customers with standard equipment as well as custom solutions:

• Table top manual equipment
• Integrated metrology modules
• Automatic open cassette systems
• 300 mm and 450 mm FOUP based systems