NanoPhotonics - Surface inspection and edge inspection on bare semiconductor wafers NanoPhotonics COMPANY - Nanophotonics' History
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OUR STRENGTH:
OUR STAFF!


Highly-skilled people
form a strong team:
Application
Service
Software
Engineering
Integration


Milestones in NanoPhotonics' History

1997NP founded
by Dr. Michael Abraham and Jan Melles.

1999
The Photonics Spectra Circle of Excellence Award
for ELLIPSON®, the world’s smallest laser ellipsometer.

2000
A strategic partnership with ASM has been
established with the vision to integrate NP’s ultra
compact thin film and defect inspection devices into
ASM's various process tools.

2001
SEMICON West introduction of Ellipsometer
integrated to a Brooks Automation sorter

2002
The first REFLEX TableTop shipped to SUESS, Munich,
as a versatile cost effectiv defect inspection system.

2003
A joint development program with a leading Wafer
manufacturer started to develop automatic wafer back
side and edge inspection technology for 300 mm wafer
manufacturing

2004
ELLIPSON MetriCube® Laser Ellipsometer integrated
to ASMJ CVD tool

2004
REFLEX AF 300 mm automatic defect inspection
system shipped to Taiwanese customer

2006
JANUS® combined defect inspection& ellipsometer
tool integrated to ASM’s A412 vertical furnace

2006
First REFLEX MC EBI systems for edge and back side
defect inspection delivered to leading wafer manufacturer

2008
200/300 mm Glass Silicon Defect Inspection tool
shipped to major back-End of line manufacturer

2008
NanoPhotonics becomes member of the Ricmar Group
www.Ricmar.com

2009NanoPhotonics releases next generation of edge
""inspection technology

450 mm surface and edge inspection tools
successfully installed at ISMI

Surface defect inspection tool shipped to US based
manufacturer of advanced PV cells

Inspection tool for mask blanks shipped to leading
manufacturer of lithography equipment


2010NanoPhotonics developed a new High Sensitivity-65nm
""Particle & Defect Detection System
for Mask Blanks
""and Bare Wafers. Initial tests show a clear detection of
""64nm latex spheres on bare Si-Wafers. The system
""
features high sensitivity, high throughput at low cost.

 


OUR MISSION
Inspection Equipment
for defects on


Surface, edge and back side
of bare wafers

Mask blanks

Glass and compound
semiconductors

NOTEWORTHY FACTS
President: Dr. M. Abraham

R&D, assembly and test

Own class 100/10 cleanroom

Worldwide customer support

Integration and engineering services

Zeindl_Abraham

ESC - Environmental and Quality Standards Certification
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