Articles / Conference Presentation

December, 2011
Next Generation Edge Defect Inspection with sub-Micrometer Sensitivity
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September, 2010
An vorderster Front: Europäische Forschung an der nächsten Generation von Halbleiterscheiben mit 450 mm Durchmesser
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September, 2010
Successful Market Entrance with Enhanced Productivity and Higher Yields of Photomasks
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Events & News

NanoPhotonics GmbH honored with the “Success 2010 Innovation Award” from the German State of Rheinland-Pfalz

June 2010, ISB BankRhineland-Palatinate Germany, awarded regional high tech companies for successful Product- / and Process Development.

Unlike similar prizes, the “Success 2010 Innovation Award” from the German State of Rhineland-Palatinate, does not only recognize product innovation, but rather product-/ and process innovations that already have been successfully introduced and established in the market.

7 companies were nominated in total, including NanoPhotonics.

Hendrik Hering, minister of economic affairs, finally awarded NanoPhotonics with 2nd Place of the “Success 2010 Innovation Award” for their achievements in the development and market introduction of the first 450mm wafer inspection system.

Next generation 450mm wafer technologies are gradually entering into pilot-phase at leading wafer manufacturers.

NanoPhotonics was able to deliver the world’s first system to International SEMATECH Manufacturing Initiative (ISMI), USA.

ISMI is a wholly owned subsidiary of SEMATECH, dedicated to helping improve the productivity and cost performance of equipment and manufacturing operations. It utilizes the NP Inspection System successfully to test 450mm wafers from Intel, Samsung and TSMC.

For further information, please contact sales@nanophotonics.de