NanoPhotonics - Surface inspection and edge inspection on bare semiconductor wafers
NanoPhotonics - Homepage COMPANY PRODUCTS SUPPORT NEWS JOBS CONTACT



AMX 6000 Mask Blank Inspection System
AMX 6000 Mask Blank Inspection System

Scheme of the AMX 6000
Scheme of the AMX 6000 version
 with two FSI modules, 1 dual arm robot,
4 open cassette load ports and a flipper

AMX 6000 – Automated Mask Blank Inspection Equipment

Description

The AMX 6000 is an automated system designed for frontend applications in mask shops and mask blank manufacturers. Very high throughput up to 45 mask blanks per hour and compact design are the highlights of this tool. Typical applications are incoming quality inspection of mask blanks and continuous tool monitoring for particle adders during manufacturing of mask blanks, e.g. coaters, writers, etchers, cleaners.

Features

  • Particle sensitivity down to 90 nm LSE
    on Cr
  • Diode laser 635 nm or 405 nm
  • Front side and/or back side inspection
  • Various load port configurations:
    • 2 RSP
    • EUV dual pod opener
    • up to 4 open cassettes
  • Reticle flipper
  • Reticle turn table
  • Reticle stocker

Benefits

  • High throughput up to 45 Blanks/h
  • Low cost of ownership
  • Replacing high end reticle inspection systems
  • Fast ROI < 6 month
  • Small footprint

 


Product overview

WAFER
Front Side Inspection (FSI)

Back Side Inspection (BSI)

Edge Defect Inspection (EDI)

Combined Edge and
Back Side Inspection (EBI)

Inspection Equipment for 450 mm Wafers

MASK BLANKS AND RETICLES
Mask Blank Inspection Equipment

PSL Calibration Wafers and Calibration Mask Blanks

ESC - Environmental and Quality Standards Certification
Sitemap Imprint / Disclaimer
Copyright © 2012 NanoPhotonics GmbH. All rights reserved.